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Infrared absorption by conical silicon microstructures made in a variety of background gases using femtosecond-laser pulses

Younkin, R., Carey, J. E., Mazur, E., Levinson, J. A., Friend, C. M.·2003·Journal of Applied Physics

Abstract

We show that the near-unity infrared absorptance of conical microstructures fabricated by irradiating a Si(111) surface with 100 fs laser pulses depends on the ambient gas in which the structures are formed. SF6 produces an absorptance of 0.9 for radiation in the 1.2–2.5 μm wavelength range, higher than any of the other gases. Use of Cl2, N2, or air produces surfaces with absorptances intermediate between that for microstructures formed in SF6 and that for flat crystalline silicon, for which the absorptance is roughly 0.05–0.2 for a 260 μm thick sample. Secondary ion mass spectrometry shows that elements from the ambient gas are incorporated into the silicon surface in high concentration.

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Metadata

Authors
Younkin, R., Carey, J. E., Mazur, E., Levinson, J. A., & Friend, C. M.
Venue
Journal of Applied Physics
Published
2003-03-01
Volume
93
Issue
5
Pages
2626-2629
ISSN
  • 0021-8979 (ISSN-L)
  • 1089-7550
OpenAlex
W1966664178
Cited by
243
References
0
FWCI
7.80
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Infrared absorption by conical silicon microstructures made in a variety of background gases using femtosecond-laser pulses. https://app.cochat.ai/papers/10.1063/1.1545159
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Younkin, R., Carey, J. E., Mazur, E., Levinson, J. A., & Friend, C. M. (2003). Infrared absorption by conical silicon microstructures made in a variety of background gases using femtosecond-laser pulses. Journal of Applied Physics. https://doi.org/10.1063/1.1545159

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