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Increased mobility from regioregular poly(3-hexylthiophene) field-effect transistors

Wang, Guangming, Swensen, James, Moses, Daniel, Heeger, Alan J.·2003·Journal of Applied Physics

Abstract

Relatively high mobilities, μ=0.2 cm2 V−1 s−1 in the accumulation mode and μ=0.17 cm2 V−1 s−1 in the depletion mode, are reported for regioregular poly(3-hexylthiophene) (RR-P3HT) in field-effect transistors (FETs). Significantly higher mobility is obtained from FETs in which the RR-P3HT film is applied by dip-coating to a thickness of only 20−40 Å. These observations suggest that structural order of the semiconducting polymer at the interface between the semiconducting polymer and the SiO2 gate insulator is of paramount importance for achieving high carrier mobility. Heat treatment under nitrogen at 160 °C for 3 min increases the on/off ratio of the FET.

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Metadata

Authors
Wang, G., Swensen, J., Moses, D., & Heeger, A. J.
Venue
Journal of Applied Physics
Published
2003-05-15
Volume
93
Issue
10
Pages
6137-6141
ISSN
  • 0021-8979 (ISSN-L)
  • 1089-7550
OpenAlex
W2084976638
Cited by
418
References
0
FWCI
30.50
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Increased mobility from regioregular poly(3-hexylthiophene) field-effect transistors. https://app.cochat.ai/papers/10.1063/1.1568526
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Wang, G., Swensen, J., Moses, D., & Heeger, A. J. (2003). Increased mobility from regioregular poly(3-hexylthiophene) field-effect transistors. Journal of Applied Physics. https://doi.org/10.1063/1.1568526

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