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TEMPERATURE DEPENDENCE OF AVALANCHE MULTIPLICATION IN SEMICONDUCTORS

Crowell, C. R., Sze, S. M.·1966·Applied Physics Letters

Abstract

Expressions for the temperature dependence of the carrier mean free path for optical phonon scattering and the mean energy loss per collision are presented which predict avalanche multiplication as a function of electric field for any operating temperature once the appropriate parameters have been determined at a single temperature. This has been verified for electrons in Si by the correlation of measurements at 300°K, 213°K, and 100°K. The temperature dependence of the breakdown voltages of a variety of abrupt and linear-graded Si and Ge p-n junctions has also been predicted. The fractional change in breakdown voltage with increasing temperature is predicted to decrease with increased doping concentration and, for the same breakdown voltage, to be less for linear-graded junctions than for abrupt junctions.

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Metadata

Authors
Crowell, C. R., & Sze, S. M.
Venue
Applied Physics Letters
Published
1966-09-15
Volume
9
Issue
6
Pages
242-244
ISSN
  • 0003-6951 (ISSN-L)
  • 1077-3118
OpenAlex
W2068111547
Cited by
458
References
0
FWCI
8.27
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: TEMPERATURE DEPENDENCE OF AVALANCHE MULTIPLICATION IN SEMICONDUCTORS. https://app.cochat.ai/papers/10.1063/1.1754731
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Crowell, C. R., & Sze, S. M. (1966). TEMPERATURE DEPENDENCE OF AVALANCHE MULTIPLICATION IN SEMICONDUCTORS. Applied Physics Letters. https://doi.org/10.1063/1.1754731

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