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Gas diffusion barriers on polymers using Al2O3 atomic layer deposition
Abstract
Thin films of Al2O3 grown by atomic layer deposition (ALD) were investigated as gas diffusion barriers on flexible polyethylene naphthalate and Kapton® polyimide substrates. Al2O3 ALD films with thicknesses of 1–26nm were grown at 100–175°C. For Al2O3 ALD films with thicknesses ⩾5nm, oxygen transmission rates were below the MOCON instrument test limit of ∼5×10−3cc∕m2∕day. Applying a more sensitive radioactive tracer method, H2O-vapor transmission rates of ∼1×10−3g∕m2∕day were measured for single-sided Al2O3 ALD films with thicknesses of 26nm on the polymers. Ultrathin gas diffusion barriers grown by Al2O3 ALD may enable organic displays and electronics on permeable, flexible polymer substrates.
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Cited by
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Song, E., Li, J., Won, S. M., Bai, W., & Rogers, J. A. (2020) · Nature Materials · doi:10.1038/s41563-020-0679-7 · Cited by 498
Recent progress on thin-film encapsulation technologies for organic electronic devices
Yu, D., Yang, Y.-Q., Chen, Z., Tao, Y., & Liu, Y.-F. (2016) · Optics Communications · doi:10.1016/j.optcom.2015.08.021 · Cited by 274
Metadata
- Authors
- Groner, M. D., George, S. M., McLean, R. S., & Carcia, P. F.
- Venue
- Applied Physics Letters
- Publisher
- AIP Publishing
- Published
- 2006-01-30
- Volume
- 88
- Issue
- 5
- ISSN
- 0003-6951 (ISSN-L)
- 1077-3118
- OpenAlex
- W1645764499
- Cited by
- 399
- References
- 0
- FWCI
- 15.86
- Type
- journal article
- Language
- en
- Open access
- closed
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- Groner, M. D., George, S. M., McLean, R. S., & Carcia, P. F. (2006). Gas diffusion barriers on polymers using Al2O3 atomic layer deposition. Applied Physics Letters. https://doi.org/10.1063/1.2168489
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