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Accurate control of ion bombardment in remote plasmas using pulse-shaped biasing
Open accessAbstract
This paper deals with a pulsed biasing technique employed to a downstream expanding thermal plasma. Two pulsed biasing approaches are presented: asymmetric rectangular pulses and modulated pulses with a linear voltage slope during the pulse, and their applicability is discussed on the basis of the intrinsic capacitance of the processed substrate-layer system. The substrate voltage and current waveforms are measured, and the relation to the obtained ion energy distributions is discussed. Accurate control of the ion bombardment is demonstrated for both aforementioned cases, and the cause of broadening of the peaks in the ion energy spectra is determined as well. Moreover, several methods to determine the modulated pulse duration, such that the sloping voltage exactly compensates for the drop of the substrate sheath potential due to charging, are presented and their accuracy is discussed.
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References 24 · Cited by 42
Research works printed but not linked: 25
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Metadata
- Authors
- Kudlacek, P., Rumphorst, R. F., & van de Sanden, M. C. M.
- Affiliations
- Eindhoven University of Technology Department of Applied Physics, Plasma and Material Processing Group, , 5600 MB Eindhoven, The Netherlands
- Eindhoven University of Technology (NL)
- Venue
- Journal of Applied Physics
- Publisher
- AIP Publishing
- Published
- 2009-10-01
- Volume
- 106
- Issue
- 7
- ISSN
- 0021-8979 (ISSN-L)
- 1089-7550
- OpenAlex
- W2089287113
- Cited by
- 42
- References
- 24
- Citations by year
- 2026: 3 · 2025: 1 · 2024: 1 · 2022: 4 · 2021: 3 · 2020: 3 · 2019: 1 · 2018: 2 · 2015: 6 · 2014: 2 · 2013: 1 · 2012: 4
- FWCI
- 3.97
- Type
- journal article
- Language
- en
- Open access
- bronze
- doi.org
- Locations
- Journal of Applied Physics (publishedVersion)
- TU/e Research Portal (publishedVersion, other-oa)
- TU/e Research Portal (submittedVersion)
- TU/e Research Portal (submittedVersion, other-oa)
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Low-Pressure Plasma Processing and Diagnostics
- Physical Sciences › Physics and Astronomy › Atomic and Molecular Physics, and Optics › Vacuum and Plasma Arcs
- Physical Sciences › Physics and Astronomy › Atomic and Molecular Physics, and Optics › Atmospheric-Pressure Plasma Applications
- Keywords
- remote plasma, expanding thermal plasma, substrate capacitance, ion energy distribution, substrate charging, pulse duration optimization
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