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Titanium nitride oxidation chemistry: An x-ray photoelectron spectroscopy study

Saha, Naresh C., Tompkins, Harland G.·1992·Journal of Applied Physics

Abstract

We report a study of the oxidation of TiN. In previous work, the oxidation kinetics for 350–450 °C were reported and an initiation time prior to fast oxidation was identified. In this study, x-ray photoelectron spectroscopy was used to investigate the oxidation mechanisms at 350 °C during this initiation time period. The oxide thickness increases slowly with oxidation time and the film appears to change from an amorphous TiO2 layer to a crystalline TiO2 layer. Spectral features which are intermediate between TiO2 and TiN are reported and a model involving grain boundary oxidation is proposed. One of the thicker oxides studied was annealed in vacuum to 700 °C. Following oxidation, some of the capping oxide and much of the intermediate material is no longer in the analysis volume and we suggest that the oxygen and nitrogen is being dissolved into the bulk in much the same way that nonevaporable getters are activated before use.

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Metadata

Authors
Saha, N. C., & Tompkins, H. G.
Venue
Journal of Applied Physics
Published
1992-10-01
Volume
72
Issue
7
Pages
3072-3079
ISSN
  • 0021-8979 (ISSN-L)
  • 1089-7550
OpenAlex
W2026500752
Cited by
1,164
References
0
FWCI
2.80
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Titanium nitride oxidation chemistry: An x-ray photoelectron spectroscopy study. https://app.cochat.ai/papers/10.1063/1.351465
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Saha, N. C., & Tompkins, H. G. (1992). Titanium nitride oxidation chemistry: An x-ray photoelectron spectroscopy study. Journal of Applied Physics. https://doi.org/10.1063/1.351465

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