Student or educator? Sign up with your school email and get 6 months of Pro free.
Cited by 174

The DOI matches its Crossref record; 2 of the 2 references it cites were found in a registry or an index.

The integration of high-k dielectric on two-dimensional crystals by atomic layer deposition

Open access
Liu, Han, Xu, Kun, Zhang, Xujie, Ye, Peide D.·2012·Applied Physics Letters

Abstract

We investigate the integration of Al2O3 high-k dielectric on two-dimensional (2D) crystals of boron nitride (BN) and molybdenum disulfide (MoS2) by atomic layer deposition (ALD). We demonstrate the feasibility of direct ALD growth with trimethylaluminum and water as precursors on both 2D crystals. Through theoretical and experimental studies, we found that the initial ALD cycles play the critical role, during which physical adsorption dominates precursor adsorption at the crystal surface. We model the initial ALD growth stages at the 2D surface by analyzing Lennard-Jones potentials, which could guide future optimization of the ALD process on 2D crystals.

Overview

The claims and statistics of this paper haven’t been checked yet.

Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.

A few free checks a day · papers already verified open instantly · results are public

Integrity signals

Registry

Crossref · 10.1063/1.3703595

Cites

2 of 2 references verified0 citation errors · 0 not checkable

Statistics

Verification

Claims the paper makes

The claims and statistics of this paper haven’t been checked yet.

Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.

A few free checks a day · papers already verified open instantly · results are public

Self-check

Percentages, sums and reported differences re-computed from the paper’s own numbers.

The self-check needs the paper’s full text.

Citations

Cites

Show all 2 references

Cited by

See all 174

Metadata

Authors
Liu, H., Xu, K., Zhang, X., & Ye, P. D.
Venue
Applied Physics Letters
Published
2012-04-09
Volume
100
Issue
15
ISSN
  • 0003-6951 (ISSN-L)
  • 1077-3118
OpenAlex
W1972958016
Cited by
174
References
2
FWCI
8.34
Type
journal article
Language
en
Open access
green

About these checks

Registry, retraction, Cites and statistics results are computed, not judged, with one exception: a printed reference that no index lists is read once by a model before it counts as a citation error. Claims are extracted by a model and kept only when their quote appears verbatim in the text; each cited source is then checked, with a model’s help, for whether it says what the claim relies on. Those verdicts can be wrong — read the claim’s quote and the cited source before relying on one.

Statistics and arithmetic are recomputed, not judged.

Confidence bands are shown only for fields calibrated on our annotated test set. None is calibrated yet, so no band is shown.

What counts as a claim ›How we measure confidence ›How we check this ›

Are you an author, or do you see a problem with this page? Request a review

How to cite

Cite CoChat for the checks on this page, and the paper for its own findings.

This page
CoChat. (2026). Citation check: The integration of high-k dielectric on two-dimensional crystals by atomic layer deposition. https://app.cochat.ai/papers/10.1063/1.3703595
The paper
Liu, H., Xu, K., Zhang, X., & Ye, P. D. (2012). The integration of high-k dielectric on two-dimensional crystals by atomic layer deposition. Applied Physics Letters. https://doi.org/10.1063/1.3703595

Data sources

Bibliographic data: Semantic Scholar, OpenAlex, Crossref.

Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.