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Cited by 208

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Patterning of silicon surfaces with noncontact atomic force microscopy: Field-induced formation of nanometer-size water bridges

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Garcı́a, Ricardo, Calleja, Montserrat, Rohrer, Heinrich·1999·Journal of Applied Physics

Abstract

Nanometer-size water bridges have been used to confine the oxidation of silicon surfaces with a noncontact atomic force microscope. The formation of a water bridge between two surfaces separated by a gap of a few nanometers is driven by the application of an electrical field. Once a liquid bridge is formed, its length and neck diameter can be modified by changing the tip-sample separation. The liquid bridge provides the ionic species and the spatial confinement to pattern Si(100) surfaces in noncontact force microscopy. The method is applied to write arrays of several thousands dots with a periodicity of 40 nm and an average width of 10 nm.

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Metadata

Authors
Garcı́a, R., Calleja, M., & Rohrer, H.
Venue
Journal of Applied Physics
Published
1999-08-15
Volume
86
Issue
4
Pages
1898-1903
ISSN
  • 0021-8979 (ISSN-L)
  • 1089-7550
OpenAlex
W2084742543
Cited by
208
References
0
FWCI
6.06
Type
journal article
Language
en
Open access
bronze

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CoChat. (2026). Citation check: Patterning of silicon surfaces with noncontact atomic force microscopy: Field-induced formation of nanometer-size water bridges. https://app.cochat.ai/papers/10.1063/1.370985
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Garcı́a, R., Calleja, M., & Rohrer, H. (1999). Patterning of silicon surfaces with noncontact atomic force microscopy: Field-induced formation of nanometer-size water bridges. Journal of Applied Physics. https://doi.org/10.1063/1.370985

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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.