Hafnium nitride films for thermoreflectance transducers at high temperatures: Potential based on heating from laser absorption

Abstract

Time domain thermoreflectance (TDTR) and frequency domain thermoreflectance (FDTR) are common pump-probe techniques that are used to measure the thermal properties of materials. At elevated temperatures, transducers used in these techniques can become limited by melting or other phase transitions. In this work, time domain thermoreflectance is used to determine the viability of HfN thin film transducers grown on SiO2 through measurements of the SiO2 thermal conductivity up to approximately 1000 K. Further, the reliability of HfN as a transducer is determined by measuring the thermal conductivities of MgO, Al2O3, and diamond at room temperature. The thermoreflectance coefficient of HfN was found to be 1.4 × 10−4 K−1 at 800 nm, one of the highest thermoreflectance coefficients measured at this standard TDTR probe wavelength. Additionally, the high absorption of HfN at 400 nm is shown to enable reliable laser heating to elevate the sample temperature during a measurement, relative to other transducers.