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Increased optical damage resistance in lithium niobate

Bryan, D. A., Gerson, Robert, Tomaschke, H. E.·1984·Applied Physics Letters

Abstract

We have confirmed greatly improved resistance to photorefractive damage in compositions of lithium niobate containing 4.5 at. % MgO or more. Holographic diffraction measurements of photorefraction demonstrated that the improved performance is due to a hundredfold increase in the photoconductivity, rather than a decrease in the Glass current. The diffraction efficiency shows an Arrhenius dependence on temperature, with an activation energy of 0.1 eV for the damage-resistant compositions, compared with 0.5 eV for undoped or low-magnesium compositions. The damage-resistant compositions are distinguished by a 2.83-μm absorption line instead of the usual 2.87-μm line due to the OH-stretch vibration.

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Metadata

Authors
Bryan, D. A., Gerson, R., & Tomaschke, H. E.
Venue
Applied Physics Letters
Published
1984-05-01
Volume
44
Issue
9
Pages
847-849
ISSN
  • 0003-6951 (ISSN-L)
  • 1077-3118
OpenAlex
W2058242280
Cited by
635
References
0
FWCI
4.48
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Increased optical damage resistance in lithium niobate. https://app.cochat.ai/papers/10.1063/1.94946
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Bryan, D. A., Gerson, R., & Tomaschke, H. E. (1984). Increased optical damage resistance in lithium niobate. Applied Physics Letters. https://doi.org/10.1063/1.94946

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