The DOI matches its Crossref record; 4 of the 4 references it cites were found in a registry or an index.
Effect of hydrogen plasma treatment on transparent conducting oxides
Abstract
The effect of hydrogen plasma treatment on indium tin oxide (ITO), fluorine-doped tin oxide (FTO), and indium-doped zinc oxide (IZO) films has been studied. X-ray photoelectron spectroscopy analysis shows that ITO and FTO surfaces get reduced to yield elemental indium and tin, respectively. Annealing of the plasma treated films in air leads to re-oxidation of the reduced surface and the electro-optical properties are recovered. In contrast, IZO films are not reduced by plasma treatment and show no changes in the electrical and optical properties. The surface of plasma treated IZO films shows a higher binding energy O(1s) peak probably due to OH or OH...O species which appear to form a protective layer against plasma degradation.
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Citations
Cites
Transparent conductors—A status review
Chopra, K. L., Major, S. S., & Pandya, D. K. (1983) · Thin Solid Films · doi:10.1016/0040-6090(83)90256-0 · Cited by 2,700
Self-citationCurrent Topics in Materials Science
Kaldis, E., & Sirtl, E. (1980) · Journal of The Electrochemical Society · doi:10.1149/1.2129974 · Cited by 2,264
An ESCA study of the termination of the passivation of elemental metals
Barr, T. L. (1978) · The Journal of Physical Chemistry · doi:10.1021/j100505a006 · Cited by 893
The infrared spectrum of hydrogen chemisorbed on zinc oxide
Eischens, R. P. (1962) · Journal of Catalysis · doi:10.1016/0021-9517(62)90022-2 · Cited by 196
Cited by
Thin‐film solar cells: an overview
Chopra, K. L., Paulson, P. D., & Dutta, V. (2004) · Progress in Photovoltaics: Research and Applications · doi:10.1002/pip.541 · Cited by 1,308
Self-citationCold Radiofrequency Plasma Treatment Modifies Wettability and Germination Speed of Plant Seeds
Bormashenko, E., Grynyov, R., Bormashenko, Y., & Drori, E. (2012) · Scientific Reports · doi:10.1038/srep00741 · Cited by 355
Metadata
- Authors
- Major, S., Kumar, S., Bhatnagar, M., & Chopra, K. L.
- Venue
- Applied Physics Letters
- Publisher
- AIP Publishing
- Published
- 1986-08-18
- Volume
- 49
- Issue
- 7
- Pages
- 394-396
- ISSN
- 0003-6951 (ISSN-L)
- 1077-3118
- OpenAlex
- W1987111397
- Cited by
- 623
- References
- 4
- FWCI
- 4.05
- Type
- journal article
- Language
- en
- Open access
- closed
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