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Cited by 623

The DOI matches its Crossref record; 4 of the 4 references it cites were found in a registry or an index.

Effect of hydrogen plasma treatment on transparent conducting oxides

Major, S., Kumar, Satyendra, Bhatnagar, M., Chopra, K. L.·1986·Applied Physics Letters

Abstract

The effect of hydrogen plasma treatment on indium tin oxide (ITO), fluorine-doped tin oxide (FTO), and indium-doped zinc oxide (IZO) films has been studied. X-ray photoelectron spectroscopy analysis shows that ITO and FTO surfaces get reduced to yield elemental indium and tin, respectively. Annealing of the plasma treated films in air leads to re-oxidation of the reduced surface and the electro-optical properties are recovered. In contrast, IZO films are not reduced by plasma treatment and show no changes in the electrical and optical properties. The surface of plasma treated IZO films shows a higher binding energy O(1s) peak probably due to OH or OH...O species which appear to form a protective layer against plasma degradation.

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Crossref · 10.1063/1.97598

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Metadata

Authors
Major, S., Kumar, S., Bhatnagar, M., & Chopra, K. L.
Venue
Applied Physics Letters
Published
1986-08-18
Volume
49
Issue
7
Pages
394-396
ISSN
  • 0003-6951 (ISSN-L)
  • 1077-3118
OpenAlex
W1987111397
Cited by
623
References
4
FWCI
4.05
Type
journal article
Language
en
Open access
closed

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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

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