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Cited by 169

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Focused ion beam applications to solid state devices

Open access
Matsui, Shinji, Ochiai, Yukinori·1996·Nanotechnology

Abstract

The current state of focused ion beam (FIB) applications in relation to solid state devices is reviewed, and recent use of FIB technology for lithography, etching, deposition, and doping are described. Etching and deposition have become essential processes for failure analysis and for mask repair in silicon ULSL production. Furthermore, the FIB doping technique has been used to fabricate quantum effect devices.

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Crossref · 10.1088/0957-4484/7/3/013

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Metadata

Authors
Matsui, S., & Ochiai, Y.
Venue
Nanotechnology
Published
1996-09-01
Volume
7
Issue
3
Pages
247-258
ISSN
  • 0957-4484 (ISSN-L)
  • 1361-6528
OpenAlex
W1972155666
Cited by
169
References
0
FWCI
1.54
Type
journal article
Language
en
Open access
bronze

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CoChat. (2026). Citation check: Focused ion beam applications to solid state devices. https://app.cochat.ai/papers/10.1088/0957-4484/7/3/013
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Matsui, S., & Ochiai, Y. (1996). Focused ion beam applications to solid state devices. Nanotechnology. https://doi.org/10.1088/0957-4484/7/3/013

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Bibliographic data: Semantic Scholar, OpenAlex, Crossref.

Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.