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Etching materials with an atmospheric-pressure plasma jet
Abstract
A plasma jet has been developed for etching materials at atmospheric pressure and between 100 and C. Gas mixtures containing helium, oxygen and carbon tetrafluoride were passed between an outer, grounded electrode and a centre electrode, which was driven by 13.56 MHz radio frequency power at 50 to 500 W. At a flow rate of , a stable, arc-free discharge was produced. This discharge extended out through a nozzle at the end of the electrodes, forming a plasma jet. Materials placed 0.5 cm downstream from the nozzle were etched at the following maximum rates: for Kapton ( and He only), for silicon dioxide, for tantalum and for tungsten. Optical emission spectroscopy was used to identify the electronically excited species inside the plasma and outside in the jet effluent.
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Citations
Cites
Physical and chemical properties of singlet molecular oxygen
Kearns, D. R. (1971) · Chemical Reviews · doi:10.1021/cr60272a004 · Cited by 913
Cited by
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Lu, X., Laroussi, M., & Puech, V (2012) · Plasma Sources Science and Technology · doi:10.1088/0963-0252/21/3/034005 · Cited by 844
Arc‐Free Atmospheric Pressure Cold Plasma Jets: A Review
Laroussi, M., & Akan, T. (2007) · Plasma Processes and Polymers · doi:10.1002/ppap.200700066 · Cited by 699
Cold atmospheric plasma, a novel promising anti-cancer treatment modality
Yan, D., Sherman, J. H., & Keidar, M. (2017) · Oncotarget · doi:10.18632/oncotarget.13304 · Cited by 543
Kalia, S., Thakur, K., Celli, A., Kiechel, M. A., & Schauer, C. L. (2013) · Journal of Environmental Chemical Engineering · doi:10.1016/j.jece.2013.04.009 · Cited by 289
Metadata
- Authors
- Jeong, J. Y., Babayan, S. E., Tu, V. J., Park, J., Henins, I., Hicks, R. F., & Selwyn, G. S.
- Venue
- Plasma Sources Science and Technology
- Publisher
- IOP Publishing
- Published
- 1998-08-01
- Volume
- 7
- Issue
- 3
- Pages
- 282-285
- ISSN
- 0963-0252 (ISSN-L)
- 1361-6595
- OpenAlex
- W2036812893
- Cited by
- 316
- References
- 1
- FWCI
- 5.82
- Type
- journal article
- Language
- en
- Open access
- closed
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- Jeong, J. Y., Babayan, S. E., Tu, V. J., Park, J., Henins, I., Hicks, R. F., & Selwyn, G. S. (1998). Etching materials with an atmospheric-pressure plasma jet. Plasma Sources Science and Technology. https://doi.org/10.1088/0963-0252/7/3/005
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Bibliographic data: Semantic Scholar, OpenAlex, Crossref.
Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.
