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Surface Plasmons in Thin Films

Economou, E. N.·1969·Physical Review

Abstract

The dispersion relations for surface plasma oscillations in normal metals are investigated for single- and multiple-film systems taking retardation effects into account. The simple dielectric function $\ensuremath{\epsilon}(\ensuremath{\omega})=1\ensuremath{-}\frac{{{\ensuremath{\omega}}_{p}}^{2}}{{\ensuremath{\omega}}^{2}}$ is found to be adequate for the high-frequency region in which oscillations remain undamped. Two types of possible modes of oscillation are found. One type corresponds to dispersion relations which behave linearly for not-so-high frequency, with a phase velocity always smaller than the velocity of light in the dielectric, but at least ten times larger than the Fermi velocity, while the other type consists of high-frequency modes ($\ensuremath{\omega}\ensuremath{\sim}{\ensuremath{\omega}}_{p}$). The role of these oscillations in the problem of transition radiation is reexamined. In the case of a thin metal film, a new interpretation is proposed for the peak observed in the transition radiation spectrum. Finally, the work is extended to superconducting metals where, in the frequency range $\ensuremath{\hbar}\ensuremath{\omega}<2\ensuremath{\Delta}$ ($2\ensuremath{\Delta}$ is the superconducting energy gap), we have justified the use of a dielectric function of the same functional form as given above but with ${{\ensuremath{\omega}}_{p}}^{2}$ replaced by an almost frequency-independent quantity ${{\ensuremath{\omega}}_{\mathrm{ps}}}^{2}$, where ${\ensuremath{\omega}}_{\mathrm{ps}}=\frac{c}{{\ensuremath{\lambda}}_{\mathrm{ps}}}$ and ${\ensuremath{\lambda}}_{\mathrm{ps}}$ is the actual penetration depth. In this frequency range, the oscillations are essentially undamped and play an important role in the electromagnetic properties of the multiple-film systems, and particularly when the systems exhibit the ac Josephson effect.

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Metadata

Authors
Economou, E. N.
Venue
Physical Review
Published
1969-06-10
Volume
182
Issue
2
Pages
539-554
ISSN
0031-899X (ISSN-L)
OpenAlex
W2088911595
Cited by
1,363
References
0
FWCI
13.20
Type
journal article
Language
en
Open access
closed

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Economou, E. N. (1969). Surface Plasmons in Thin Films. Physical Review. https://doi.org/10.1103/physrev.182.539

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