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Chemical potential dependence of defect formation energies in GaAs: Application to Ga self-diffusion

Zhang, S., Northrup, John·1991·Physical Review Letters

Abstract

We calculate absolute formation energies of native defects in GaAs. The formation energy and hence the equilibrium concentration of the defects depends strongly on the atomic chemical potentials of As and Ga as well as the electron chemical potential. For example, the Ga vacancy concentration changes by more than ten orders of magnitude as the chemical potentials of As and Ga vary over the thermodynamically allowed range. This result indicates that the rate of self-diffusion depends strongly on the surface-annealing conditions.

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Authors
Zhang, S., & Northrup, J.
Venue
Physical Review Letters
Published
1991-10
Volume
67
Issue
17
Pages
2339-2342
ISSN
0031-9007 (ISSN-L)
OpenAlex
W1990393409
Cited by
1,791
References
0
FWCI
7.31
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Chemical potential dependence of defect formation energies in GaAs: Application to Ga self-diffusion. https://app.cochat.ai/papers/10.1103/physrevlett.67.2339
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Zhang, S., & Northrup, J. (1991). Chemical potential dependence of defect formation energies in GaAs: Application to Ga self-diffusion. Physical Review Letters. https://doi.org/10.1103/physrevlett.67.2339

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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

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