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New Generation of Predictive Technology Model for Sub-45 nm Early Design Exploration

Zhao, W., Cao, Y.·2006·IEEE Transactions on Electron Devices

Abstract

A predictive MOSFET model is critical for early circuit design research. To accurately predict the characteristics of nanoscale CMOS, emerging physical effects, such as process variations and correlations among model parameters, must be included. In this paper, a new generation of predictive technology model (PTM) is developed to accomplish this goal. Based on physical models and early-stage silicon data, the PTM of bulk CMOS is successfully generated for 130- to 32-nm technology nodes, with an Leffof as low as 13 nm. The accuracy of PTM predictions is comprehensively verified: The error of Ionis below 10% for both n-channel MOS and p-channel MOS. By tuning only ten primary parameters, the PTM can be easily customized to cover a wide range of process uncertainties. Furthermore, the new PTM correctly captures process sensitivities in the nanometer regime, particularly the interactions among Leff, Vth, mobility, and saturation velocity. A website has been established for the release of PTM: http://www.eas.asu.edu/~ptm

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Metadata

Authors
Zhao, W., & Cao, Y.
Venue
IEEE Transactions on Electron Devices
Published
2006-11
Volume
53
Issue
11
Pages
2816-2823
ISSN
  • 0018-9383 (ISSN-L)
  • 1557-9646
OpenAlex
W2069345435
Cited by
852
References
0
FWCI
58.03
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: New Generation of Predictive Technology Model for Sub-45 nm Early Design Exploration. https://app.cochat.ai/papers/10.1109/ted.2006.884077
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Zhao, W., & Cao, Y. (2006). New Generation of Predictive Technology Model for Sub-45 nm Early Design Exploration. IEEE Transactions on Electron Devices. https://doi.org/10.1109/ted.2006.884077

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