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Volatility Diagrams for Silica, Silicon Nitride, and Silicon Carbide and Their Application to High‐Temperature Decomposition and Oxidation
Abstract
Volatility diagrams—isothermal plots showing the partial pressures of two gaseous species in equilibrium with the several condensed phases possible in a system—are discussed for the Si‐O and Si‐N systems, and extended to the Si‐N‐O and Si‐C‐O systems, in which the important ceramic constituents SiO 2 , Si 3 N 4 , Si 2 N 2 O, and SiC appear as stable phases. Their use in understanding the passiveactive oxidation transitions for Si, Si 3 N 4 , and SiC are demonstrated.
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Cited by
Opeka, M. M., Talmy, I. G., & Zaykoski, J. A. (2004) · Journal of Materials Science · doi:10.1023/b:jmsc.0000041686.21788.77 · Cited by 965
Review of high temperature ceramics for aerospace applications
Soboyejo, W. O., Obayemi, J. D., Annan, E., Ampaw, E. K., Daniels, L., & Rahbar, N. (2015) · Advanced materials research · doi:10.4028/www.scientific.net/amr.1132.385 · Cited by 55
Metadata
- Authors
- Heuer, A. H., & Lou, V. L. K.
- Venue
- Journal of the American Ceramic Society
- Publisher
- Wiley
- Published
- 1990-10
- Volume
- 73
- Issue
- 10
- Pages
- 2789-2803
- ISSN
- 0002-7820 (ISSN-L)
- 1551-2916
- OpenAlex
- W2161587235
- Cited by
- 238
- References
- 0
- FWCI
- 8.25
- Type
- journal article
- Language
- en
- Open access
- closed
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- CoChat. (2026). Citation check: Volatility Diagrams for Silica, Silicon Nitride, and Silicon Carbide and Their Application to High‐Temperature Decomposition and Oxidation. https://app.cochat.ai/papers/10.1111/j.1151-2916.1990.tb06677.x
- The paper
- Heuer, A. H., & Lou, V. L. K. (1990). Volatility Diagrams for Silica, Silicon Nitride, and Silicon Carbide and Their Application to High‐Temperature Decomposition and Oxidation. Journal of the American Ceramic Society. https://doi.org/10.1111/j.1151-2916.1990.tb06677.x
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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
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