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Nanoscale patterning using self-assembled polymers for semiconductor applications
Abstract
Thin films of self-organizing diblock copolymers may be suitable for semiconductor applications since they enable patterning of ordered domains with dimensions below photolithographic resolution over wafer-scale areas. We investigate the process window for forming ordered arrays of nanoscale polymer domains in thin films across 8-in.-diam silicon wafers, including the effect of substrate material and surface treatment, annealing conditions, copolymer molecular weight, and film thickness. We also demonstrate pattern transfer of the nanoporous polymer template using both reactive ion etching and metal lift off.
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Citations
Cited by
Directing the self-assembly of block copolymers
Darling, S. B. (2007) · Progress in Polymer Science · doi:10.1016/j.progpolymsci.2007.05.004 · Cited by 1,019
Nanostructure fabrication using block copolymers
Hamley, I. W. (2003) · Nanotechnology · doi:10.1088/0957-4484/14/10/201 · Cited by 773
Bit-Patterned Magnetic Recording: Theory, Media Fabrication, and Recording Performance
Albrecht, T. R., Arora, H., Ayanoor-Vitikkate, V., Beaujour, J.-M., Bedau, D., Berman, D., Bogdanov, A. L., Chapuis, Y.-A., Cushen, J., Dobisz, E. E., et al. (2015) · IEEE Transactions on Magnetics · doi:10.1109/tmag.2015.2397880 · Cited by 398
Nanoporous Materials from Block Copolymer Precursors
Hillmyer, M. A. (2005) · Advances in Polymer Science · doi:10.1007/12_002 · Cited by 353
(2007) · doi:10.1002/9783527610570.ch9 · Cited by 20
Metadata
- Authors
- Guarini, K. W., Black, C. T., Milkove, K. R., & Sandstrom, R. L.
- Venue
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
- Publisher
- American Vacuum Society
- Published
- 2001-11-01
- Volume
- 19
- Issue
- 6
- Pages
- 2784-2788
- ISSN
- 1071-1023 (ISSN-L)
- 1520-8567
- OpenAlex
- W2052638041
- Cited by
- 175
- References
- 0
- FWCI
- 5.93
- Type
- journal article
- Language
- en
- Open access
- closed
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- Guarini, K. W., Black, C. T., Milkove, K. R., & Sandstrom, R. L. (2001). Nanoscale patterning using self-assembled polymers for semiconductor applications. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena. https://doi.org/10.1116/1.1421551
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Bibliographic data: Semantic Scholar, OpenAlex, Crossref.
Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.
