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Submicroscopic pattern replication with visible light

Fischer, U. Ch., Zingsheim, H. P.·1981·Journal of Vacuum Science and Technology

Abstract

Contact imaging with visible light is possible at submicroscopic resolution because the near field of a radiating object contains information of sufficiently high resolution. In this paper we demonstrate this principle by contact imaging of planar submicroscopic metal patterns with blue light (400 nm). Experimental details are described for two experiments: (1) The shadow of an opaque pattern was recorded on a negative photoresist and developed using permanganate staining. (2) An image of a transparent metal pattern was imprinted onto a molecular dye layer, exploiting the fact that photochemical bleaching of the dye is inhibited by contact with the metal due to energy transfer. Development was by silver decoration. The resolution obtained was 100 nm with the photoresist, and 50 to 70 nm with the dye layer.

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Metadata

Authors
Fischer, U. C., & Zingsheim, H. P.
Venue
Journal of Vacuum Science and Technology
Published
1981-11-01
Volume
19
Issue
4
Pages
881-885
ISSN
0022-5355 (ISSN-L)
OpenAlex
W2046895154
Cited by
418
References
0
FWCI
0.53
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Submicroscopic pattern replication with visible light. https://app.cochat.ai/papers/10.1116/1.571227
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Fischer, U. C., & Zingsheim, H. P. (1981). Submicroscopic pattern replication with visible light. Journal of Vacuum Science and Technology. https://doi.org/10.1116/1.571227

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