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Atomic Resolution of the Silicon (111)-(7×7) Surface by Atomic Force Microscopy
Open accessAbstract
Achieving high resolution under ultrahigh-vacuum conditions with the force microscope can be difficult for reactive surfaces, where the interaction forces between the tip and the samples can be relatively large. A force detection scheme that makes use of a modified cantilever beam and senses the force gradient through frequency modulation is described. The reconstructed silicon (111)-(7×7) surface was imaged in a noncontact mode by force microscopy with atomic resolution (6 angstroms lateral, 0.1 angstrom vertical).
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Metadata
- Authors
- Giessibl, F. J.
- Venue
- Science
- Published
- 1995-01-06
- Volume
- 267
- Issue
- 5194
- Pages
- 68-71
- ISSN
- 0036-8075 (ISSN-L)
- 1095-9203
- OpenAlex
- W1980745639
- Cited by
- 1,189
- References
- 0
- FWCI
- 19.04
- Type
- journal article
- Language
- en
- Open access
- green
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- CoChat. (2026). Citation check: Atomic Resolution of the Silicon (111)-(7×7) Surface by Atomic Force Microscopy. https://app.cochat.ai/papers/10.1126/science.267.5194.68
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- Giessibl, F. J. (1995). Atomic Resolution of the Silicon (111)-(7×7) Surface by Atomic Force Microscopy. Science. https://doi.org/10.1126/science.267.5194.68
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