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Atomistic Processes in the Early Stages of Thin-Film Growth
Abstract
Growth of thin films from atoms deposited from the gas phase is intrinsically a nonequilibrium phenomenon governed by a competition between kinetics and thermodynamics. Precise control of the growth and thus of the properties of deposited films becomes possible only after an understanding of this competition is achieved. Here, the atomic nature of the most important kinetic mechanisms of film growth is explored. These mechanisms include adatom diffusion on terraces, along steps, and around island corners; nucleation and dynamics of the stable nucleus; atom attachment to and detachment from terraces and islands; and interlayer mass transport. Ways to manipulate the growth kinetics in order to select a desired growth mode are briefly addressed.
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Cited by
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Xia, Y., Xiong, Y., Lim, B., & Skrabalak, S. E. (2009) · Angewandte Chemie International Edition · doi:10.1002/anie.200802248 · Cited by 5,702
Effects of Polycrystalline Cu Substrate on Graphene Growth by Chemical Vapor Deposition
Wood, J. D., Schmucker, S. W., Lyons, A. S., Pop, E., & Lyding, J. W. (2011) · Nano Letters · doi:10.1021/nl201566c · Cited by 470
Self-diffusion barriers: possible descriptors for dendrite growth in batteries?
Jäckle, M., Helmbrecht, K., Smits, M., Stottmeister, D., & Groß, A. (2018) · Energy & Environmental Science · doi:10.1039/c8ee01448e · Cited by 365
THERMODYNAMICS OF NUCLEATION AND GROWTH
TROMP, R. M., & HANNON, J. B. (2002) · Surface Review and Letters · doi:10.1142/s0218625x02003846 · Cited by 80
Metadata
- Authors
- Zhang, Z., & Lagally, M. G.
- Venue
- Science
- Published
- 1997-04-18
- Volume
- 276
- Issue
- 5311
- Pages
- 377-383
- ISSN
- 0036-8075 (ISSN-L)
- 1095-9203
- OpenAlex
- W2010397121
- Cited by
- 980
- References
- 0
- FWCI
- 25.57
- Type
- journal article
- Language
- en
- Open access
- closed
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- Zhang, Z., & Lagally, M. G. (1997). Atomistic Processes in the Early Stages of Thin-Film Growth. Science. https://doi.org/10.1126/science.276.5311.377
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