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Phase Stability of Nickel Hydroxides and Oxyhydroxides

Van der Ven, A., Morgan, D., Meng, Y. S., Ceder, G.·2006·Journal of The Electrochemical Society

Abstract

We investigate phase stability of several nickel hydroxides from first-principles. Hydrogen removal from is predicted to occur through a biphasic reaction to involving a change in the stacking sequence from T1 [for ] to P3 (for ). Further topotactic removal of hydrogen from can only occur after a step in a range between 0.4 and is surpassed. We also propose an energetically stable crystal structure for stoichiometric , which offers an explanation for the oxidation limit of 3.66 for Ni. In this structure, potassium in the intercalation layer resides halfway between adjacent trigonal prismatic sites. We conclude with a discussion of the role of the electrolyte in determining phase stability as well as the voltage profile of .

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Metadata

Authors
Van der Ven, A., Morgan, D., Meng, Y. S., & Ceder, G.
Venue
Journal of The Electrochemical Society
Published
2006
Volume
153
Issue
2
Pages
A210
ISSN
0013-4651 (ISSN-L)
OpenAlex
W2161625807
Cited by
236
References
0
FWCI
2.82
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Phase Stability of Nickel Hydroxides and Oxyhydroxides. https://app.cochat.ai/papers/10.1149/1.2138572
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Van der Ven, A., Morgan, D., Meng, Y. S., & Ceder, G. (2006). Phase Stability of Nickel Hydroxides and Oxyhydroxides. Journal of The Electrochemical Society. https://doi.org/10.1149/1.2138572

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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

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