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Infrared Reflectance of Evaporated Aluminum Films
Abstract
The specular reflectance of evaporated aluminum films has been measured with high precision (±0.1%) from 0.55 to 32 μ. The measurements were made at normal incidence on fresh and aged films deposited on fuzed quartz substrates with rapid evaporation rates at pressures of about 1×10−5 Torr. The dependence of the reflectance on the evaporation conditions was also investigated, and it was found that the infrared reflectance of aluminum prepared under the usual high-vacuum conditions is reproducible and insensitive to the conditions of film preparation. Although the measured reflectance of freshly evaporated aluminum films differs by only 0.1% at 30 μ from the value calculated from the free-electron approximation assuming bulk parameters for aluminum, the variation of the measured reflectance with wavelength does not fit the theory in the infrared. It is felt that the validity of the free-electron approximation should be further tested by using films deposited in ultra-high vacuum.
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“As shown in Fig. 8(a), the laser interacts with the bare Al surface, which has poor absorptivity (AAl ≈ 5% [33]), resulting in poor energy absorption.”
From Effect of nickel interlayer thickness on intermetallic compound formation and interfacial integrity in pulsed laser welding of aluminum and copper (2026) · cites this paper as [33]
In the citing paper
“both Aland Cu exhibit high thermal diffusivity (αAl ≈ 97 mm²/s, αCu ≈ 111 mm²/s) and low laser absorptivity (AAl ≈ 5%[33], ACu ≈ 1%[45]) at near-IR wavelengths.”
From Effect of nickel interlayer thickness on intermetallic compound formation and interfacial integrity in pulsed laser welding of aluminum and copper (2026) · cites this paper as [33]
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Cited by
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Singh, R., Arora, N., & Choudhary, A. (2026) · Welding in the World · doi:10.1007/s40194-026-02375-5 · Cited by 6
“8(a), the laser interacts with the bare Al surface, which has poor absorptivity (A Al ≈ 5% [33]), resulting in poor energy absorption.”
Metadata
- Authors
- Bennett, H. E., Bennett, J. M., & Ashley, E. J.
- Affiliations
- Naval Air Warfare Center Weapons Division (US)
- Venue
- Journal of the Optical Society of America
- Publisher
- Optica Publishing Group
- Published
- 1962-11-01
- Volume
- 52
- Issue
- 11
- Pages
- 1245
- ISSN
- 0030-3941 (ISSN-L)
- OpenAlex
- W1988327261
- Cited by
- 75
- References
- 0
- Citations by year
- 2026: 3 · 2025: 1 · 2024: 1 · 2022: 1 · 2021: 1 · 2018: 1 · 2017: 1 · 2016: 1 · 2015: 2 · 2014: 1 · 2013: 4 · 2012: 2
- FWCI
- 6.15
- Type
- journal article
- Language
- en
- Open access
- closed
- Locations
- Journal of the Optical Society of America (publishedVersion)
- Topics
- Physical Sciences › Materials Science › Surfaces, Coatings and Films › Optical Coatings and Gratings
- Physical Sciences › Physics and Astronomy › Instrumentation › Surface Roughness and Optical Measurements
- Physical Sciences › Physics and Astronomy › Condensed Matter Physics › Surface and Thin Film Phenomena
- Keywords
- infrared reflectivity, specular reflectance, free-electron approximation, film aging, evaporation conditions, ultrahigh vacuum deposition, fused quartz substrate
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