Advances in optical metasurfaces: fabrication and applications [Invited]
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The research and development of optical metasurfaces has been primarily driven by the curiosity for novel optical phenomena that are unattainable from materials that exist in nature and by the desire for miniaturization of optical devices. Metasurfaces constructed of artificial patterns of subwavelength depth make it possible to achieve flat, ultrathin optical devices of high performance. A wide variety of fabrication techniques have been developed to explore their unconventional functionalities which in many ways have revolutionized the means with which we control and manipulate electromagnetic waves. The relevant research community could benefit from an overview on recent progress in the fabrication and applications of the metasurfaces. This review article is intended to serve that purpose by reviewing the state-of-the-art fabrication methods and surveying their cutting-edge applications.
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Patterning, thin-film etching, lift-off, and additive manufacturing all introduce inevitable geometric deviations between experimental devices and ideal, theoretical designs.
“Patterning [25–27], thin-film etching, lift-off, and additive manufacturing [28] all introduce inevitable geometric deviations between experimental devices and ideal, theoretical designs.”
From Robust design of topology-optimized metasurfaces (2019) · cites this paper as [25]
Section 2.4 (page unavailable) describes alignment error in multi-exposure lithography, and Section 2.1 (page unavailable) notes spatial drift during ion-beam milling. These support the possibility of fabrication-related deviations, but the paper does not establish that patterning, thin-film etching, lift-off, and additive manufacturing all inevitably produce geometric deviations from theoretical designs. (LLM, conf=0.78)
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- Authors
- Su, V.-C., Chu, C. H., Sun, G., & Tsai, D. P.
- Affiliations
- National United University (TW)
- Research Center for Applied Science, Academia Sinica (TW)
- University of Massachusetts Boston (US)
- Venue
- Optics Express
- Publisher
- Optica Publishing Group
- Published
- 2018-05-07
- Volume
- 26
- Issue
- 10
- Pages
- 13148
- ISSN
- 1094-4087 (ISSN-L)
- OpenAlex
- W2799876747
- Cited by
- 361
- References
- 157
- Citations by year
- 2026: 32 · 2025: 59 · 2024: 43 · 2023: 43 · 2022: 52 · 2021: 38 · 2020: 45 · 2019: 34 · 2018: 15
- FWCI
- 9.89
- Type
- journal article
- Language
- en
- Open access
- gold
- doi.org
- Locations
- Optics Express (publishedVersion)
- PubMed (publishedVersion)
- Funders
- Academia Sinica (AS-103-TP-A06)
- Air Force Office of Scientific Research (AFOSR) (Grant No. FA9550-17-1-0354)
- Ministry of Science and Technology, Taiwan (MOST) (MOST-106-2745-M-002-003-ASP)
- Topics
- Physical Sciences › Materials Science › Electronic, Optical and Magnetic Materials › Metamaterials and Metasurfaces Applications
- Physical Sciences › Engineering › Aerospace Engineering › Advanced Antenna and Metasurface Technologies
- Physical Sciences › Materials Science › Surfaces, Coatings and Films › Optical Coatings and Gratings
- Keywords
- optical metasurfaces, metasurface fabrication, subwavelength nanostructures, flat optics, electromagnetic wave manipulation
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