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Beyond the Rayleigh scattering limit in high-Q silicon microdisks: theory and experiment

Open access
Borselli, Matthew, Johnson, Thomas J., Painter, Oskar·2005·Optics Express

Abstract

Using a combination of resist reflow to form a highly circular etch mask pattern and a low-damage plasma dry etch, high-quality-factor silicon optical microdisk resonators are fabricated out of silicon-on-insulator (SOI) wafers. Quality factors as high as Q = 5x10(6) are measured in these microresonators, corresponding to a propagation loss coefficient as small as alpha ~ 0.1 dB/cm. The different optical loss mechanisms are identified through a study of the total optical loss, mode coupling, and thermally-induced optical bistability as a function of microdisk radius (5-30 microm). These measurements indicate that optical loss in these high-Q microresonators is limited not by surface roughness, but rather by surface state absorption and bulk free-carrier absorption.

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Metadata

Authors
Borselli, M., Johnson, T. J., & Painter, O.
Venue
Optics Express
Published
2005
Volume
13
Issue
5
Pages
1515
ISSN
1094-4087 (ISSN-L)
OpenAlex
W2066219575
Cited by
494
References
1
FWCI
30.19
Type
journal article
Language
en
Open access
gold

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CoChat. (2026). Citation check: Beyond the Rayleigh scattering limit in high-Q silicon microdisks: theory and experiment. https://app.cochat.ai/papers/10.1364/opex.13.001515
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Borselli, M., Johnson, T. J., & Painter, O. (2005). Beyond the Rayleigh scattering limit in high-Q silicon microdisks: theory and experiment. Optics Express. https://doi.org/10.1364/opex.13.001515

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