Geh, Bernd
ASML (United States)
2 papers on CoChat
Most cited papers
- Verified
Understanding illumination effects for control of optical proximity effects (OPE)
Flagello, D. G., Geh, B., Socha, R., Liu, P., Cao, Y., Stas, R., Natt, O., & Zimmermann, J. (2008) · SPIE Proceedings
Advancements in Photolithography TechniquesAdvanced optical system design
Cited by 11
- Verified
Printing 130-nm DRAM isolation pattern: Zernike correlation and tool improvement
van Schoot, J. B., Seong, N., Geh, B., Burkhardt, M., Graeupner, P., Reisinger, G., Rubingh, R., Suddendorf, M., Finders, J., & Rikkers, E. (2001) · SPIE Proceedings
Advancements in Photolithography TechniquesAdvanced optical system design
Cited by 4
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