Fujioka, H.

University of California, Berkeley

1 paper on CoChatORCID 0000-0001-7242-4249

Most cited papers

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Fabrication of metal–oxide–semiconductor devices with extreme ultraviolet lithography
Nguyen, K. B., Cardinale, G. F., Tichenor, D. A., Kubiak, G. D., Berger, K., Ray-Chaudhuri, A. K., Perras, Y., Haney, S. J., Nissen, R., Krenz, K., et al. (1996) · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Advancements in Photolithography TechniquesSemiconductor materials and devices
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