Chao, Weilun

A new regime of nanoscale thermal transport: Collective diffusion increases dissipation efficiency

Hoogeboom-Pot, K. M., Hernandez-Charpak, J. N., Gu, X., Frazer, T. D., Anderson, E. H., Chao, W., Falcone, R. W., Yang, R., Murnane, M. M., Kapteyn, H. C., et al. (2015) · Proceedings of the National Academy of Sciences

Thermal properties of materialsThermoelastic and Magnetoelastic Phenomena

Cited by 202

How we are making the 0.5-NA Berkeley mirco-field exposure tool stable and productive

Anderson, C. N., Allezy, A., Chao, W., Conley, L., Cork, C., Cork, W., Delano, R., DePonte, J., Dickinson, M., Gaines, G., et al. (2020) · Extreme Ultraviolet (EUV) Lithography XI

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

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