Cho, Won-Ju

Charge trapping properties of the HfO2 layer with various thicknesses for charge trap flash memory applications

You, H.-W., & Cho, W.-J. (2010) · Applied Physics Letters

Semiconductor materials and devicesFerroelectric and Negative Capacitance Devices

Cited by 158

Performance Enhancement of Capacitive-Coupling Dual-gate Ion-Sensitive Field-Effect Transistor in Ultra-Thin-Body

Jang, H.-J., & Cho, W.-J. (2014) · Scientific Reports

Analytical Chemistry and SensorsAdvancements in Semiconductor Devices and Circuit Design

Cited by 103

Sensitivity enhancement of amorphous InGaZnO thin film transistor based extended gate field-effect transistors with dual-gate operation

Jang, H.-J., Gu, J.-G., & Cho, W.-J. (2013) · Sensors and Actuators B: Chemical

Analytical Chemistry and SensorsGas Sensing Nanomaterials and Sensors

Cited by 76