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Challenges to Optimize Charge Trapping Non-Volatile Flash Memory Cells: A Case Study of HfO2/Al2O3 Nanolaminated Stacks

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Transparent Flash Memory Using Single Ta2O5 Layer for Both Charge-Trapping and Tunneling Dielectrics

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Total Ionization Dose Effects on Charge-Trapping Memory With Al2O3/HfO2/Al2O3Trilayer Structure

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A Study on the Charge Trapping Characteristics of High-k Laminated Traps

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Energy-Efficient III–V Tunnel FET-Based Synaptic Device with Enhanced Charge Trapping Ability Utilizing Both Hot Hole and Hot Electron Injections for Analog Neuromorphic Computing

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A Graphene Oxide Quantum Dots Embedded Charge Trapping Memory With Enhanced Memory Window and Data Retention

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Highly Reliable Charge Trap‐Type Organic Non‐Volatile Memory Device Using Advanced Band‐Engineered Organic‐Inorganic Hybrid Dielectric Stacks

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Nonvolatile Poly-Si TFT Charge-Trap Flash Memory With Engineered Tunnel Barrier

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Flash memory based on solution processed hafnium dioxide charge trapping layer

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Radiation Tolerance and Charge Trapping Enhancement of ALD HfO2/Al2O3 Nanolaminated Dielectrics

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Improved Charge-Trapping Characteristics of ZrO 2 by Al Doping for Nonvolatile Memory Applications

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Simulation Study of the Trapping Properties of ${\rm HfO}_{2}$ -Based Charge-Trap Memory Cells

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Trap‐Assisted Memristive Switching in HfO2‐Based Devices Studied by In Situ Soft and Hard X‐Ray Photoelectron Spectroscopy

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Multilevel characteristics and operating mechanisms of nonvolatile memory devices based on a floating gate of graphene oxide sheets sandwiched between two polystyrene layers

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Charge Trapping Layer Enabled Normally-Off β-Ga2O3 MOSFET

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Nonvolatile flash memory device with ferroelectric blocking layer via in situ ALD process

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2D materials-based crossbar array for neuromorphic computing hardware

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Light-erasable embedded charge-trapping memory based on MoS2 for system-on-panel applications

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Effects of Interfacial Fluorination on Performance Enhancement of High-k-Based Charge Trap Flash Memory

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Effect of charge trap layer thickness on the charge spreading behavior within a few seconds in 3D charge trap flash memory

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Toward Low-Power Flash Memory: Prospect of Adopting Crystalline Oxide as Charge Trapping Layer

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Performance Enhancement for Charge Trapping Memory by Using Al2O3/HfO2/Al2O3Tri-Layer High-κ Dielectrics and High Work Function Metal Gate

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Quantification of Interfacial Charges in Multilayered Nanocapacitors by Operando Electron Holography

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Synergic Impacts of CF 4 Plasma Treatment and Post-thermal Annealing on the Nonvolatile Memory Performance of Charge-Trap-Assisted Memory Thin-Film Transistors Using Al–HfO 2 Charge Trap and In–Ga–Zn–O Active Channel Layers

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Impact of the Nonlinear Dielectric Hysteresis Properties of a Charge Trap Layer in a Novel Hybrid High-Speed and Low-Power Ferroelectric or Antiferroelectric HSO/HZO Boosted Charge Trap Memory

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Improvement of Charge Injection by Using Separated SiN as Charge Trapping Layer in MONOS Charge Trap Flash Memory

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Memory Devices with HfO2 Charge-Trapping and TiO2 Channel Layers: Fabrication via Remote and Direct Plasma Atomic Layer Deposition and Comparative Performance Evaluation

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Performance-improved nonvolatile memory with aluminum nanocrystals embedded in Al2O3 for high temperature applications

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Deep electron traps in HfO2-based metal-oxide-semiconductor capacitors

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Field-driven modulating of In-Sn-O synaptic transistors with a precisely controlled weight update

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Nb-Doped $\hbox{La}_{2}\hbox{O}_{3} $ as Charge-Trapping Layer for Nonvolatile Memory Applications

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Nb-doped Ga 2 O 3 as charge-trapping layer for nonvolatile memory applications

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Characterizations of MoTiO5 flash memory devices with post-annealing

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Charge-trapping MOS memory structure using anodic alumina charging medium

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Design and analysis of Si–Ag–graphene–HfO2 heterojunction based ultraviolet photodetector

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Study of Memory Performance and Electrical Characteristics for Metal Nanocrystal Memories

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Impacts of annealing temperature on charge trapping performance in Zr0.5Hf0.5O2 for nonvolatile memory

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Colloidal metal oxides in electronics and optoelectronics

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Improved Memory Window and Retention of Silicon Channel Hf0.5Zr0.5O2 FeFET by Using SiO2/HfO2/SiO2 Gate Side Interlayer

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Investigation of heavy ion irradiation effects on a charge trapping memory capacitor by C–V measurement

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Acoustic spectroscopy and electrical characterization of Si/NAOS-SiO2/HfO2 structures

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Fabrication and characterization of HfxAl(1-x)Oy ceramic targets and thin films by RF sputtering

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Energy band alignments of Al2O3–HfO2/Al2O3 nanolaminates–SiO2–p-type Si structures

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Investigating the Charge Trapping Behavior and Enhancing the Memory Window of Silicon Channel Hf0.5Zr0.5O2 FeFET With SiO2/HfO2/SiO2 Gate Side Interlayer

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Role of ultra-thin MgO tunneling and blocking layers in HfO2-based charge trap flash memory

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Electrical properties of HfO 2 charge trap flash memory with SiO 2/HfO 2/Al 2O 3 engineered tunnel layer

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Charge Storage and Reliability Characteristics of Nonvolatile Memory Capacitors with HfO2/Al2O3-Based Charge Trapping Layers

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The Study of Charge Trapping in Mahas Memory Structure with Various HfO2 Trap Layer Thicknesses

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Electron and Hole Trapping Characteristics of a Low-Temperature Atomic Layer-Deposited HfO 2 Charge-Trap Layer for Charge-Trap Flash Memory

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