Pollentier, Ivan

EUV Resist Process Performance Investigations on the NXE3100 Full Field Scanner

Goethals, A.-M., Foubert, P., Hosokawa, K., Roey, F. V., Niroomand, A., Heuvel, D. V. D., & Pollentier, I. (2012) · Journal of Photopolymer Science and Technology

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 30

EUV pellicle scanner integration for N2 nodes and beyond

van de Kerkhof, M. A., Klein, A., Seoane, B., Vermeulen, P., Gallagher, E., Timmermans, M. Y., Pollentier, I., & Bekaert, J. (2023) · Optical and EUV Nanolithography XXXVI

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 16

Self-assembled monolayers as inhibitors for area-selective deposition: A novel approach towards resist-less EUV lithography

Lodha, J. K., Pollentier, I., Conard, T., Vallat, R., De Gendt, S., & Armini, S. (2022) · Applied Surface Science

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 16