Franke, Joern-Holger

Evaluation of Lines and Spaces printing and general understanding of imaging with dark field low-n mask

Kovalevich, T., Van Look, L., Franke, J.-H., & Philipsen, V. (2023) · Journal of Micro/Nanopatterning, Materials, and Metrology

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 18

Best focus alignment through pitch strategies for hyper-NA EUV lithography

Lee, I., Franke, J.-H., Philipsen, V., Ronse, K., De Gendt, S., & Hendrickx, E. (2024) · Optical and EUV Nanolithography XXXVII

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 7