Woo, Jihoon

The University of Texas at Dallas · Inha University

1 paper on CoChatORCID 0000-0003-2844-9216

Most cited papers

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Chemical reactions induced by low-energy electron exposure on a novel inorganic-organic hybrid dry EUV photoresist deposited by molecular atomic layer deposition (MALD)
Le, D. N., Hwang, S. M., Woo, J., Choi, S., Park, T., Veyan, J.-F., Tiwale, N. M., Subramanian, A., Lee, W.-I., Nam, C.-Y., et al. (2022) · International Conference on Extreme Ultraviolet Lithography 2022
Advancements in Photolithography TechniquesSemiconductor materials and devices
Cited by 11

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