Troost, Kars Z.

High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond

van Schoot, J., van Setten, E., Rispens, G., Troost, K. Z., Kneer, B., Migura, S., Neumann, J. T., & Kaiser, W. (2017) · Journal of Micro/Nanopatterning, Materials, and Metrology

Advancements in Photolithography TechniquesAdvanced optical system design

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EUV source-mask optimization for 7nm node and beyond

Liu, X., Howell, R., Hsu, S., Yang, K., Gronlund, K., Driessen, F., Liu, H.-Y., Hansen, S., van Ingen Schenau, K., Hollink, T., et al. (2014) · SPIE Proceedings

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

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