Krysak, Marie

Development of an inorganic photoresist for DUV, EUV, and electron beam imaging

Trikeriotis, M., Bae, W. J., Schwartz, E., Krysak, M., Lafferty, N., Xie, P., Smith, B., Zimmerman, P. A., Ober, C. K., & Giannelis, E. P. (2010) · SPIE Proceedings

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 78

A new inorganic EUV resist with high-etch resistance

Trikeriotis, M., Krysak, M., Chung, Y. S., Ouyang, C., Cardineau, B., Brainard, R., Ober, C. K., Giannelis, E. P., & Cho, K. (2012) · SPIE Proceedings

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 75

Lithographic stochastics: beyond 3σ

Bristol, R. L., & Krysak, M. E. (2017) · SPIE Proceedings

Advancements in Photolithography TechniquesIndustrial Vision Systems and Defect Detection

Cited by 11