The DOI matches its Crossref record; 7 of the 7 references it cites were found in a registry or an index.
Lithographic stochastics: beyond 3σ
Abstract
As lithography tools continue their progress in both NA and wavelength in pursuit of Moore’s law, we have reached the point where the number of features printed in a single pass can now easily surpass 1 trillion. Statistically, then, one should not be surprised to see some members of such a population exhibit fluctuations as great as 7σ. But what do these fluctuations look like? We consider the problem in terms of variations in the effective local resist sensitivity caused by feature-to-feature differences in absorbed photons and resist component counts. We model such variations as a normal distribution, rather than the CDs themselves. As the CD vs. Dose curve is generally nonlinear over large ranges, the normal distribution of the local effective sensitivity then maps to a non-normal distribution in CD. For the case of individual vias printed near the resolution limit, this results in many more such undersized or completely closed vias than one would expect from a normal distribution of the CDs. We show examples of this behavior from both EUV exposures in the fab, and ebeam exposures in the lab. For the latter, results from a simple resist with a somewhat low quencher loading produce approximately the CD variation one would expect by modeling the quencher as distributed normally in the resist.
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Cites
Acid generation and acid diffusion in photoresist films
McKean, D. R., ALLEN, R. D., Kasai, P. H., et al. (1992) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.59751 · Cited by 35
Resist pattern prediction at EUV
Biafore, J. J., Smith, M. D., van Setten, E., Wallow, T., Naulleau, P. P., Blankenship, D., Robertson, S. A., & Deng, Y. (2010) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.846535 · Cited by 34
Understanding the role of base quenchers in photoresists
Michaelson, T. B., Jamieson, A. T., Pawloski, A. R., et al. (2004) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.537658 · Cited by 19
Furukawa, K., Kozawa, T., Seki, S., et al. (2008) · Applied Physics Express · doi:10.1143/apex.1.067001 · Cited by 15
Deconstructing contact hole CD printing variability in EUV lithography
Civay, D. E., Wallow, T., Doganaksoy, N., et al. (2014) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.2049546 · Cited by 10
Simulation study of the influence of PEB reaction rates on resist LER
Bhattarai, S., Neureuther, A. R., & Naulleau, P. P. (2015) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.2087566 · Cited by 4
Fujitsu to license photocatalyst
(2002) · Focus on Catalysts · doi:10.1016/s1351-4180(02)01014-0 · Cited by 3
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Research works printed but not linked: 2
- Lane, David M, Introduction to Statistics Chp 7, Online edition, http://onlinestatbook.com/Online_Statistics_Education.pdf
- M. Born and E. Wolf, Principles of Optics (Pergamon Press, New York, 1965)
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Extreme ultraviolet lithography
Kazazis, D., Santaclara, J. G., van Schoot, J., Mochi, I., & Ekinci, Y. (2024) · Nature Reviews Methods Primers · doi:10.1038/s43586-024-00361-z · Cited by 149
Stochastic printing failures in extreme ultraviolet lithography
De Bisschop, P. (2018) · Journal of Micro/Nanopatterning, Materials, and Metrology · doi:10.1117/1.jmm.17.4.041011 · Cited by 75
Metadata
- Authors
- Bristol, R. L., & Krysak, M. E.
- Affiliations
- Intel (United States) (US)
- ORCID
- Bristol, Robert L.
- Venue
- SPIE Proceedings
- Publisher
- SPIE
- Published
- 2017-03-24
- Volume
- 10143
- Pages
- 101430Z
- ISSN
- 0277-786X (ISSN-L)
- OpenAlex
- W2600924476
- Cited by
- 11
- References
- 7
- Citations by year
- 2024: 2 · 2022: 1 · 2019: 3 · 2018: 5
- FWCI
- 3.10
- Type
- conference paper
- Language
- en
- Open access
- closed
- Locations
- Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (publishedVersion)
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advancements in Photolithography Techniques
- Physical Sciences › Engineering › Industrial and Manufacturing Engineering › Industrial Vision Systems and Defect Detection
- Physical Sciences › Physics and Astronomy › Atomic and Molecular Physics, and Optics › Advanced optical system design
- Keywords
- EUV lithography, electron beam lithography, Moore's law
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