Gräupner, Paul

EUV source-mask optimization for 7nm node and beyond

Liu, X., Howell, R., Hsu, S., Yang, K., Gronlund, K., Driessen, F., Liu, H.-Y., Hansen, S., van Ingen Schenau, K., Hollink, T., et al. (2014) · SPIE Proceedings

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

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High-NA EUV platform realization as next step in EUV technology

Garcia-Santaclara, J., Peeters, R., van Dongen, J., van Ballegoij, R., Lok, S., van Schoot, J., Gräupner, P., Kuerz, P., Mallmann, J., Stoorms, G., et al. (2023) · International Conference on Extreme Ultraviolet Lithography 2023

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 5