Philipsen, Vicky

Study of novel EUVL mask absorber candidates

Wu, M., Thakare, D., de Marneffe, J.-F., Jaenen, P., Souriau, L., Opsomer, K., Soulié, J.-P., Erdmann, A., Mesilhy, H. M. S., Naujok, P., et al. (2021) · Journal of Micro/Nanopatterning, Materials, and Metrology

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 29

Evaluation of Lines and Spaces printing and general understanding of imaging with dark field low-n mask

Kovalevich, T., Van Look, L., Franke, J.-H., & Philipsen, V. (2023) · Journal of Micro/Nanopatterning, Materials, and Metrology

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 18

Optimizing extreme ultraviolet lithography imaging metrics as a function of absorber thickness and illumination source: a simulation case study of Ta-Co alloy

Thakare, D., Delabie, A., & Philipsen, V. (2023) · Journal of Micro/Nanopatterning, Materials, and Metrology

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 8

Best focus alignment through pitch strategies for hyper-NA EUV lithography

Lee, I., Franke, J.-H., Philipsen, V., Ronse, K., De Gendt, S., & Hendrickx, E. (2024) · Optical and EUV Nanolithography XXXVII

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 7

Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal design

Xu, D., Gillijns, W., Tan, L. E., Philipsen, V., & Kim, R.-H. (2022) · Journal of Micro/Nanopatterning, Materials, and Metrology

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 5