Gronheid, Roel

Statistical simulation of photoresists at EUV and ArF

Biafore, J. J., Smith, M. D., Mack, C. A., Thackeray, J. W., Gronheid, R., Robertson, S. A., Graves, T., & Blankenship, D. (2009) · SPIE Proceedings

Advancements in Photolithography TechniquesBlock Copolymer Self-Assembly

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EUV resist requirements: absorbance and acid yield

Gronheid, R., Fonseca, C., Leeson, M. J., Adams, J. R., Strahan, J. R., Willson, C. G., & Smith, B. W. (2009) · SPIE Proceedings

Advancements in Photolithography TechniquesPhotopolymerization techniques and applications

Cited by 23