Halle, Scott

IBM (United States)

1 paper on CoChatORCID 0000-0002-5466-8298

Most cited papers

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EUV photomask defects: what prints, what doesn't, and what is required for HVM
Rankin, J., Qi, Z. J., Lawliss, M., Narita, E., Seki, K., Badger, K., Bonam, R., Halle, S., & Turley, C. (2015) · SPIE Proceedings
Advancements in Photolithography TechniquesIndustrial Vision Systems and Defect Detection
Cited by 12

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