Brainard, Robert

Photolithographic properties of tin-oxo clusters using extreme ultraviolet light (13.5nm)

Cardineau, B., Del Re, R., Marnell, M., Al-Mashat, H., Vockenhuber, M., Ekinci, Y., Sarma, C., Freedman, D. A., & Brainard, R. L. (2014) · Microelectronic Engineering

Advancements in Photolithography TechniquesOrganometallic Compounds Synthesis and Characterization

Cited by 202

A new inorganic EUV resist with high-etch resistance

Trikeriotis, M., Krysak, M., Chung, Y. S., Ouyang, C., Cardineau, B., Brainard, R., Ober, C. K., Giannelis, E. P., & Cho, K. (2012) · SPIE Proceedings

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 75

Nanoparticle Photoresists from HfO2 and ZrO2 for EUV Patterning

Trikeriotis, M., Krysaki, M., Chung, Y. S., Ouyang, C., Cardineau, B., Brainard, R., Ober, C. K., Giannelis, E. P., & Cho, K. (2012) · Journal of Photopolymer Science and Technology

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 70

EUV resists based on tin-oxo clusters

Cardineau, B., Del Re, R., Al-Mashat, H., Marnell, M., Vockenhuber, M., Ekinci, Y., Sarma, C., Neisser, M., Freedman, D. A., & Brainard, R. L. (2014) · SPIE Proceedings

Advancements in Photolithography TechniquesOrganometallic Compounds Synthesis and Characterization

Cited by 67

Resolution, LER, and sensitivity limitations of photoresists

Gallatin, G. M., Naulleau, P., Niakoula, D., Brainard, R., Hassanein, E., Matyi, R., Thackeray, J., Spear, K., & Dean, K. (2008) · SPIE Proceedings

Advancements in Photolithography TechniquesAdvanced optical system design

Cited by 54