Chen, Steven

IMEC

1 paper on CoChatORCID 0000-0003-1283-0258

Most cited papers

Verified
Adhesion and collapse of extreme ultraviolet photoresists and the role of underlayers
Fallica, R., Chen, S., De Simone, D., & Suh, H. S. (2022) · Journal of Micro/Nanopatterning, Materials, and Metrology
Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques
Cited by 25

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