Fallica, Roberto

Absorption coefficient of metal-containing photoresists in the extreme ultraviolet

Fallica, R., Haitjema, J., Wu, L., Castellanos Ortega, S., Brouwer, A. M., & Ekinci, Y. (2018) · Journal of Micro/Nanopatterning Materials and Metrology

Advancements in Photolithography TechniquesPhotopolymerization techniques and applications

Cited by 105

Adhesion and collapse of extreme ultraviolet photoresists and the role of underlayers

Fallica, R., Chen, S., De Simone, D., & Suh, H. S. (2022) · Journal of Micro/Nanopatterning, Materials, and Metrology

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 25

Functional underlayers for dose reduction and collapse mitigation in EUV lithography: a factorial analysis

Fallica, R., Huang, W., Suh, H. S., De Simone, D., Guerrero, D. J., & Kato, K. (2023) · International Conference on Extreme Ultraviolet Lithography 2023

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 1