Souriau, Laurent

Study of novel EUVL mask absorber candidates

Wu, M., Thakare, D., de Marneffe, J.-F., Jaenen, P., Souriau, L., Opsomer, K., Soulié, J.-P., Erdmann, A., Mesilhy, H. M. S., Naujok, P., et al. (2021) · Journal of Micro/Nanopatterning, Materials, and Metrology

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 29

Fabrication and room temperature characterization of trilayer junctions for the development of superconducting qubits on 300 mm wafers

Wan, D., Couet, S., Piao, X., Souriau, L., Canvel, Y., Tsvetanova, D., Vangoidsenhoven, D., Thiam, A., Pacco, A., Potočnik, A., et al. (2021) · Japanese Journal of Applied Physics

Superconducting and THz Device TechnologyQuantum Information and Cryptography

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Enabling CD SEM metrology for 5nm technology node and beyond

Lorusso, G. F., Ohashi, T., Yamaguchi, A., Inoue, O., Sutani, T., Horiguchi, N., Bömmels, J., Wilson, C. J., Briggs, B., Tan, C. L., et al. (2017) · SPIE Proceedings

Advancements in Photolithography TechniquesIntegrated Circuits and Semiconductor Failure Analysis

Cited by 11