Le, Dan N.

Atomic layer deposition and its derivatives for extreme ultraviolet (EUV) photoresist applications

Le, D. N., Park, T., Hwang, S. M., Kim, J.-H., Jung, Y. C., Tiwale, N., Subramanian, A., Lee, W.-I., Choi, R., Sung, M. M., et al. (2023) · Japanese Journal of Applied Physics

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 26

Chemical reactions induced by low-energy electron exposure on a novel inorganic-organic hybrid dry EUV photoresist deposited by molecular atomic layer deposition (MALD)

Le, D. N., Hwang, S. M., Woo, J., Choi, S., Park, T., Veyan, J.-F., Tiwale, N. M., Subramanian, A., Lee, W.-I., Nam, C.-Y., et al. (2022) · International Conference on Extreme Ultraviolet Lithography 2022

Advancements in Photolithography TechniquesSemiconductor materials and devices

Cited by 11