Lee, J.H.

Samsung (South Korea) · Samsung Advanced Institute of Technology (South Korea)

1 paper on CoChatORCID 0009-0003-1629-2116

Most cited papers

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High Work-Function Metal Gate and High-<tex>$kappa$</tex>Dielectrics for Charge Trap Flash Memory Device Applications
Jeon, S., Han, J. H., Lee, J. H., Choi, S., Hwang, H., & Kim, C. (2005) · IEEE Transactions on Electron Devices
Semiconductor materials and devicesAdvancements in Semiconductor Devices and Circuit Design
Cited by 44

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