Smith, Mark D.

KLA (United States)

1 paper on CoChatORCID 0009-0009-3215-6468

Most cited papers

Verified
Statistical simulation of photoresists at EUV and ArF
Biafore, J. J., Smith, M. D., Mack, C. A., Thackeray, J. W., Gronheid, R., Robertson, S. A., Graves, T., & Blankenship, D. (2009) · SPIE Proceedings
Advancements in Photolithography TechniquesBlock Copolymer Self-Assembly
Cited by 58

Go further with a free account

Verify every reference, keep papers in a library, and ask questions across them.

Sign up - it is free