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Templated Self‐Assembly of Block Copolymers: Effect of Substrate Topography
Abstract
Topographical confinement is used to template the formation of nanoscale domains in a self‐assembled block copolymer film. The topographical template controls the row spacings and feature dimensions of the copolymer and can deliberately introduce defects in the arrays (see Figure). For example, a sharp edge feature leads to a missing domain and pins the lateral position of the polymer array. (See also inside cover.)
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Citations
Cited by
Directing the self-assembly of block copolymers
Darling, S. B. (2007) · Progress in Polymer Science · doi:10.1016/j.progpolymsci.2007.05.004 · Cited by 1,019
Block copolymer based nanostructures: Materials, processes, and applications to electronics
Kim, H.-C., Park, S.-M., & Hinsberg, W. D. (2010) · Chemical Reviews · doi:10.1021/cr900159v · Cited by 1,017
Patterning with block copolymer thin films
Segalman, R. A. (2005) · Materials Science and Engineering: R: Reports · doi:10.1016/j.mser.2004.12.003 · Cited by 954
Colloquium: Opportunities in nanomagnetism
Bader, S. D. (2006) · Reviews of Modern Physics · doi:10.1103/revmodphys.78.1 · Cited by 706
Templated Self‐Assembly of Block Copolymers: Top‐Down Helps Bottom‐Up
Cheng, J. Y., Ross, C. A., Smith, H. I., & Thomas, E. L. (2006) · Advanced Materials · doi:10.1002/adma.200502651 · Cited by 695
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Metadata
- Authors
- Cheng, J. Y., Ross, C. A., Thomas, E. L., Smith, H. I., & Vancso, G. J.
- Venue
- Advanced Materials
- Publisher
- Wiley
- Published
- 2003-10-02
- Volume
- 15
- Issue
- 19
- Pages
- 1599-1602
- ISSN
- 0935-9648 (ISSN-L)
- 1521-4095
- OpenAlex
- W1988111430
- Cited by
- 230
- References
- 0
- FWCI
- 10.81
- Type
- journal article
- Language
- en
- Open access
- closed
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