Templated Self‐Assembly of Block Copolymers: Top‐Down Helps Bottom‐Up
Abstract
One of the key challenges in nanotechnology is to control a self‐assembling system to create a specific structure. Self‐organizing block copolymers offer a rich variety of periodic nanoscale patterns, and researchers have succeeded in finding conditions that lead to very long range order of the domains. However, the array of microdomains typically still contains some uncontrolled defects and lacks global registration and orientation. Recent efforts in templated self‐assembly of block copolymers have demonstrated a promising route to control bottom‐up self‐organization processes through top‐down lithographic templates. The orientation and placement of block‐copolymer domains can be directed by topographically or chemically patterned templates. This templated self‐assembly method provides a path towards the rational design of hierarchical device structures with periodic features that cover several length scales.
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Block copolymer based nanostructures: Materials, processes, and applications to electronics
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Extreme ultraviolet lithography
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Keen, I., Yu, A., Cheng, H.-H., Jack, K. S., Nicholson, T. M., Whittaker, A. K., & Blakey, I. (2012) · Langmuir · doi:10.1021/la304141m · Cited by 56 · see citing works
- Authors
- Cheng, J. Y., Ross, C. A., Smith, H. I., & Thomas, E. L.
- Affiliations
- IBM Research - Almaden (US)
- Massachusetts Institute of Technology (US)
- Corresponding author
- Cheng, J. Y.
- Thomas, E. L.
- Venue
- Advanced Materials
- Publisher
- Wiley
- Published
- 2006-09-26
- Volume
- 18
- Issue
- 19
- Pages
- 2505-2521
- ISSN
- 0935-9648 (ISSN-L)
- 1521-4095
- OpenAlex
- W1982690373
- Cited by
- 695
- References
- 130
- Citations by year
- 2026: 1 · 2025: 11 · 2024: 9 · 2023: 19 · 2022: 19 · 2021: 18 · 2020: 14 · 2019: 23 · 2018: 33 · 2017: 38 · 2016: 52 · 2015: 42 · 2014: 44 · 2013: 70 · 2012: 72
- FWCI
- 27.29
- Type
- journal article
- Language
- en
- Open access
- closed
- Locations
- Advanced Materials (publishedVersion)
- Topics
- Physical Sciences › Materials Science › Materials Chemistry › Block Copolymer Self-Assembly
- Physical Sciences › Chemistry › Organic Chemistry › Advanced Polymer Synthesis and Characterization
- Physical Sciences › Engineering › Biomedical Engineering › Nanofabrication and Lithography Techniques
- Keywords
- block copolymers, templated self-assembly, top-down lithography, microdomains, defect control, chemical patterning
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