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TiO2 Inverse Opals Fabricated Using Low‐Temperature Atomic Layer Deposition
Abstract
High-quality inverse-opal photonic crystals (see Figure) are formed by TiO2 infiltration and subsequent removal of SiO2 opal templates. Low-temperature atomic layer deposition followed by annealing yields highly conformal infiltrations with extremely smooth surfaces (less than 1 nm root-mean-square roughness) and filling fractions of ∼ 88 %. Photonic-bandgap properties were determined using UV-vis reflectivity and transmission measurements.
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Citations
Cited by
Titanium Dioxide Nanomaterials: Synthesis, Properties, Modifications, and Applications
Chen, X., & Mao, S. S. (2007) · Chemical Reviews · doi:10.1021/cr0500535 · Cited by 10,688
Hierarchically Structured Porous Materials for Energy Conversion and Storage
Li, Y., Fu, Z., & Su, B. (2012) · Advanced Functional Materials · doi:10.1002/adfm.201200591 · Cited by 951
Biswas, A., Bayer, I. S., Biris, A. S., Wang, T., Dervishi, E., & Faupel, F. (2012) · Advances in Colloid and Interface Science · doi:10.1016/j.cis.2011.11.001 · Cited by 909
Synthesis and Surface Engineering of Complex Nanostructures by Atomic Layer Deposition
Knez, M., Nielsch, K., & Niinistö, L. (2007) · Advanced Materials · doi:10.1002/adma.200700079 · Cited by 889
Self‐Assembled Photonic Structures
Galisteo‐López, J. F., Ibisate, M., Sapienza, R., Froufe‐Pérez, L. S., Blanco, Á., & López, C. (2011) · Advanced Materials · doi:10.1002/adma.201000356 · Cited by 668
Metadata
- Authors
- King, J. S., Graugnard, E., & Summers, C. J.
- Venue
- Advanced Materials
- Publisher
- Wiley
- Published
- 2005-04-07
- Volume
- 17
- Issue
- 8
- Pages
- 1010-1013
- ISSN
- 0935-9648 (ISSN-L)
- 1521-4095
- OpenAlex
- W2148878131
- Cited by
- 211
- References
- 0
- FWCI
- 9.43
- Type
- journal article
- Language
- en
- Open access
- closed
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